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Proceedings Paper

An Iron Oxide Mask Blank For Photofabrication Of High Density Low Defect Integrated Circuits
Author(s): M.Patrick Risen
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Paper Abstract

The use of hard surface film masks in integrated circuit photo-fabrication has increased dramatically in the past few years. The proven manufacturing economies and inherent resolution capability of hard surface masks are the major forces behind this increase.

Paper Details

Date Published: 1 March 1974
PDF: 5 pages
Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); doi: 10.1117/12.954249
Show Author Affiliations
M.Patrick Risen, Corning Glass Works (United States)

Published in SPIE Proceedings Vol. 0055:
Technological Advances in Micro and Submicro Photofabrication Imagery
William Converse; J. M. Graf, Editor(s)

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