Proceedings Paper
Photomask Terminology| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
Standardization of terminology in the IC photomask industry needs to be accomplished in the near future. Some of the difficulties usually encountered when attempting standardization, as well as suggestions on how to approach standardization are discussed. Over 125 repre-sentative IC photomask terms have been selected, categorized, and defined.
Paper Details
Date Published: 1 March 1974
PDF: 7 pages
Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); doi: 10.1117/12.954243
Published in SPIE Proceedings Vol. 0055:
Technological Advances in Micro and Submicro Photofabrication Imagery
William Converse; J. M. Graf, Editor(s)
PDF: 7 pages
Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); doi: 10.1117/12.954243
Show Author Affiliations
Phillip A. Schultz, University of California (United States)
Dino R. Ciarlo, University of California (United States)
Published in SPIE Proceedings Vol. 0055:
Technological Advances in Micro and Submicro Photofabrication Imagery
William Converse; J. M. Graf, Editor(s)
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