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Proceedings Paper

New I-Line Lenses
Author(s): Setha G. Olson
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Paper Abstract

As the semiconductor industry presses toward smaller and smaller feature sizes, new lenses with higher numerical apertures are being introduced. As more chipmakers purchase i-line steppers, the resist makers have developed new resists to exploit them. This paper will show experimental results from two new lenses offered by GCA using new, as well as established, i-line resists.

Paper Details

Date Published: 25 July 1989
PDF: 7 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953146
Show Author Affiliations
Setha G. Olson, GCA Corporation (United States)

Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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