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Proceedings Paper

Statistically Comparing Three Optical Cd Measurement Systems
Author(s): David A. Acree; Chen Lee
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Paper Abstract

The rapid technological change in the VLSI industry has resulted in a constant upgrading of measurement equipment. One question to be asked is whether the upgrades recommended really improve the measurement system. Precise measurement equipment is one of the most important components in the next generation of VLSI technology. A systematic approach to measurement equipment upgrades in one micron technology can save much grief and remove uncertainty. In order to compare three optical CD measurement systems simultaneously, a statistically designed systematic approach was employed. The major contributors of variation were identified and quantified. The precision of each optical CD system was then compared. Findings from the study showed the upgraded system reduced variability associated with machine repeatability by a third, but only reduced overall measurement variation by a tenth. The same methods used here can apply in most cases where one piece of equipment is evaluated or several are compared. Vendor claims can be easily tested through the approach described. Reductions in measurement variation associated with an upgrade can be actually quantified allowing management to weigh benefits against costs.

Paper Details

Date Published: 19 July 1989
PDF: 8 pages
Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); doi: 10.1117/12.953111
Show Author Affiliations
David A. Acree, Intel Corporation (United States)
Chen Lee, Intel Corporation (United States)

Published in SPIE Proceedings Vol. 1087:
Integrated Circuit Metrology, Inspection, and Process Control III
Kevin M. Monahan, Editor(s)

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