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Proceedings Paper

X-ray Chemical Reactions of Novolac Diazonaphthoquinone Resists
Author(s): Derrick C. Mancini; Monroe Sullivan; James W. Taylor; Richard Bormett; T. V. Jayaraman; Richard J. West
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Paper Abstract

Model cresol novolac resins and photoactive compounds (PAC) based on polyhydroxybenzophenones were prepared according to known procedures. The components and resists formulated from them were exposed to X-rays from Aladdin, the electron storage ring at the University of Wisconsin. The loss of azide functionality and the conversion of PAC to acid or ester was monitored by FTIR difference spectrometry. The energy dependence of the sensitivity of conversion of diazonaphthoquinone to ketene was followed by monitoring the loss of diazide when exposed to synchrotron radiation. The effect of PAC functionality on the sensitivity and chemical pathways was studied. The relationship of structure and photon energy to lithographic performance are explored. We discuss the applicability of synchrotron radiation as an exposure source and FTIR as an analytical tool for the study of X-ray resist mechanisms.

Paper Details

Date Published: 30 January 1989
PDF: 8 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953051
Show Author Affiliations
Derrick C. Mancini, University of Wisconsin (United States)
Monroe Sullivan, University of Wisconsin (United States)
James W. Taylor, University of Wisconsin (United States)
Richard Bormett, University of Wisconsin (United States)
T. V. Jayaraman, Olin flunt Specialty Products, Inc.. (United States)
Richard J. West, Olin flunt Specialty Products, Inc. (United States)

Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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