Proceedings Paper
Statistically Developed Single Layer Liftoff For Sputtered Films| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
A statistically developed process is described that uses the unique advantages of the AZ* 5200 reversible tone resist to produce severe retrograde slopes and accommodate a sputtered liftoff patterning. Precision thin film resistors were used in the development to measure the variability and repeatability of the process. The single level liftoff technique offers cost and processing advantages over more complicated systems.
Paper Details
Date Published: 30 January 1989
PDF: 9 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953044
Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)
PDF: 9 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953044
Show Author Affiliations
Ron Alderman, Harris Semiconductor Products Division (United States)
Pam Lou, Harris Semiconductor Products Division (United States)
Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)
© SPIE. Terms of Use
