Proceedings Paper
Evaporated Fatty Acid Resist Process| Format | Member Price | Non-Member Price |
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Paper Abstract
Double layer resist process using fatty acid and Al was proposed for fine pattern fabrication. Oriented thin films of stearic acid and w-tricosenoic acid were formed on an Al evaporated substrate by evaporation using a furnace with an orifice of a few mm diameter. Electron beam exposure characteristics of the films were studied and 2um L/S pattern was successfully developed by heating the substrate and C12 etching of Al.
Paper Details
Date Published: 30 January 1989
PDF: 4 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953035
Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)
PDF: 4 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953035
Show Author Affiliations
Hisato Kato, Nagoya Univ. (Japan)
Shinzo Morita, Nagoya Univ. (Japan)
Shinzo Morita, Nagoya Univ. (Japan)
Masahiro Tawata, Meijo Univ. (Japan)
Shuzo Hattori, Nagoya Univ. (Japan)
Shuzo Hattori, Nagoya Univ. (Japan)
Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)
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