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Proceedings Paper

Sensitive Electron Beam Resist Systems Based On Acid-Catalyzed Deprotection
Author(s): Hiroshi Ito; Lester A. Pederson; Kaolin N. Chiong; Susan Sonchik; Cecilia Tsai
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Paper Abstract

Poly(p-t-butoxycarbonyloxystyrene) (PBOCST) and poly(t-butyl p-vinylbenzoate) (PTBVB) provide sensitive, negative tone, electron beam resist systems when sensitized with "onium salt" acid generators. The sensitivity is high (0.5-2.5μC/cm2 at 20 keV) owing to chemical amplification. The resolution and contrast are also high owing to the polarity change incorporated in the design. Development with an organic solvent provides sub-half-micrometer resolution.

Paper Details

Date Published: 30 January 1989
PDF: 11 pages
Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); doi: 10.1117/12.953013
Show Author Affiliations
Hiroshi Ito, IBM Research Division (United States)
Lester A. Pederson, IBM Research Division (United States)
Kaolin N. Chiong, IBM Research Division (United States)
Susan Sonchik, IBM General Technology Division (United States)
Cecilia Tsai, IBM General Technology Division (United States)

Published in SPIE Proceedings Vol. 1086:
Advances in Resist Technology and Processing VI
Elsa Reichmanis, Editor(s)

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