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Proceedings Paper

Engineering Development For Reproducible Volume Production Of Cadmium Sulfide (CdS) Waveplates And Their Applications In Infrared Laser Systems
Author(s): Narayana S. Varanasi; Herman E. Reedy
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Paper Abstract

Single crystal cadmium sulfide waveplates have several attractive technical properties to be used as phase retarders in various low power infrared laser systems for defense and aerospace industries. CdS waveplates can be used with CO2, CO, and HF/DF laser systems. Their advantages are power handling capacity to the 100 watt CW range, low insertion loss, ease of alignment due to visible transparency and no beam off-set when inserted in the laser system. Cadmium sulfide waveplates must be manufactured to a high degree of precision in thickness, parallelism and flatness. Due to the crystalline structure, and the soft and fragile nature of the CdS material, volume production of CdS waveplates is a difficult engineering, high technology problem. Currently, these waveplates are manufactured in small quantities. To meet the growing demand for CdS waveplates for infrared laser systems used in defense and aerospace industries, we conducted several engineering and technological experiments exploring new processes and techniques of manufacture to produce waveplates in larger quantity and to study the performance of these waveplates. This paper describes the important technical properties of single crystal cadmium sulfide as a waveplate material, the problems associated with waveplate manufacture and the technological developments made in the techniques of manufacture of these waveplates.

Paper Details

Date Published: 7 July 1986
PDF: 5 pages
Proc. SPIE 0588, Recent Developments in Materials & Detectors for the Infrared, (7 July 1986); doi: 10.1117/12.951779
Show Author Affiliations
Narayana S. Varanasi, II-VI Incorporated (United States)
Herman E. Reedy, II-VI Incorporated (United States)

Published in SPIE Proceedings Vol. 0588:
Recent Developments in Materials & Detectors for the Infrared
John S. Seeley; John S. Seeley, Editor(s)

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