Proceedings Paper
Laser-Assisted Deposition Of Thin Films For Optical Applications| Format | Member Price | Non-Member Price |
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Paper Abstract
A 200 W cw CO2, laser was used to evaporate high refractory oxides, for laser substrate irradiation before the deposition and for modification of the electron beam deposition process. For the laser-assisted thin film deposition processes higher values of laser damage resistance and a correlation between laser damage resistance and absorption were found.
Paper Details
Date Published: 18 May 1989
PDF: 6 pages
Proc. SPIE 1033, Trends in Quantum Electronics, (18 May 1989); doi: 10.1117/12.950660
Published in SPIE Proceedings Vol. 1033:
Trends in Quantum Electronics
Ioan Ursu, Editor(s)
PDF: 6 pages
Proc. SPIE 1033, Trends in Quantum Electronics, (18 May 1989); doi: 10.1117/12.950660
Show Author Affiliations
D. Schafer, Akademie der Wissenschaften der DDR (DDR)
B. Brauns, Akademie der Wissenschaften der DDR (DDR)
R. Wolf, Ingenieurhochschule Mittweida (DDR)
B. Brauns, Akademie der Wissenschaften der DDR (DDR)
R. Wolf, Ingenieurhochschule Mittweida (DDR)
B. Steiger, Ingenieurhochschule Mittweida (DDR)
G. Zscherpe, Ingenieurhochschule Mittweida (DDR)
G. Zscherpe, Ingenieurhochschule Mittweida (DDR)
Published in SPIE Proceedings Vol. 1033:
Trends in Quantum Electronics
Ioan Ursu, Editor(s)
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