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Proceedings Paper

Pyrolytic Laser-Induced Chemical Vapor Deposition (LCVD) Of Microstructures
Author(s): T. Szorenyi; K. Piglmayer; D. Bauerle
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Paper Abstract

An analysis of the time evolution of the growth of W spots deposited by hydrogen reduction of WF6 under 647.1 nm Kr ion laser irradiation is presented. From measured lateral growth rates of the spots and model calculations for the temperature distributions in the deposit/substrate system the chemical kinetics that controls the deposition process is determined. The apparent chemical activation energies derived for substrates of fused quartz covered either with 70 nm of sputtered W or with 120 nm of amorphous Si (a-Si) are 30 kcal/mol and 40 kcal/mol, respectively.

Paper Details

Date Published: 18 May 1989
PDF: 7 pages
Proc. SPIE 1033, Trends in Quantum Electronics, (18 May 1989); doi: 10.1117/12.950634
Show Author Affiliations
T. Szorenyi, Research Group on Laser Physics of the Hungarian Academy of Sciences (Hungary)
K. Piglmayer, Johannes-Kepler-Universitat Linz (Austria)
D. Bauerle, Johannes-Kepler-Universitat Linz (Austria)

Published in SPIE Proceedings Vol. 1033:
Trends in Quantum Electronics
Ioan Ursu, Editor(s)

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