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Proceedings Paper

A New Kinoform Manufacturing Process
Author(s): Hans Andersson; Mats Ekberg; Sverker Hard; Stellan Jacobsson; Michael Larsson; Tomas Nilsson
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Paper Abstract

Kinoforms were manufactured by transferring computer-calculated phase-data into a photo-resist layer applied to a glass substrate. This transfer was carried out with conventional photolithographic techniques, using one single photomask exposed in discrete grey scale levels. The photomasks were generated in a specially designed PC controlled exposure system. We present kinoforms manufactured in ten levels with a pixel width of 20 μm. About SO% of the totally transmitted power was diffracted into the desired intensity distribution, and a few percent were undeflected at λ = 632.8 nm.

Paper Details

Date Published: 31 March 1989
PDF: 6 pages
Proc. SPIE 1026, Holography Techniques and Applications, (31 March 1989); doi: 10.1117/12.950228
Show Author Affiliations
Hans Andersson, Chalmers University of Technology (Sweden)
Mats Ekberg, Chalmers University of Technology (Sweden)
Sverker Hard, Chalmers University of Technology (Sweden)
Stellan Jacobsson, Chalmers University of Technology (Sweden)
Michael Larsson, Chalmers University of Technology (Sweden)
Tomas Nilsson, Radians Innova AB (Sweden)

Published in SPIE Proceedings Vol. 1026:
Holography Techniques and Applications
Werner P. O. Jueptner, Editor(s)

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