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Proceedings Paper

Overview Of Recent Advances In Excimer Laser Technology At Los Alamos
Author(s): Irving J. Bigio; Robert C. Sze; Antoinette J. Taylor; Robert F. Gibson
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Paper Abstract

From among the areas of excimer laser development at Los Alamos two are selected for further discussion: ultra-high brightness excimer laser systems and discharge-pumped XeF(C→A) lasers operating in the blue-green portion of the spectrum. Two different high brightness systems are described. One is based on small-aperture KrF amplifiers, while the other is based on a large-aperture XeC1 amplifier. The XeF(C→A) laser is tunable from 435 to 525 nm, and may one day become a viable alternative to pulsed dye lasers for many applications.

Paper Details

Date Published: 26 April 1989
PDF: 5 pages
Proc. SPIE 1023, Excimer Lasers and Applications, (26 April 1989); doi: 10.1117/12.950124
Show Author Affiliations
Irving J. Bigio, Los Alamos National Laboratory (United States)
Robert C. Sze, Los Alamos National Laboratory (United States)
Antoinette J. Taylor, Los Alamos National Laboratory (United States)
Robert F. Gibson, Los Alamos National Laboratory (United States)

Published in SPIE Proceedings Vol. 1023:
Excimer Lasers and Applications
Dirk Basting, Editor(s)

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