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Proceedings Paper

Laser Photoablation Of Poly-Ethylcyanoacrylate And Spin-On-Glass Photoresists
Author(s): J. D. Magan; M. Hogan; W. Blau; J. G. Lunney; J. G. Woods
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Paper Abstract

The photoablative characteristics of vapour deposited poly- ethylcyanoacrylate photoresist (PECA) and phenylsiloxane spin-on-glass (SOG) are reported. The photoablation was performed using 20 ns excimer laser pulses at 193 nm and 248 nm, and was monitored interferometrically by measuring the reflectivity of the irradiated area using a He-Ne laser. The microlithographic potential of these photoresists using photoablative etching was also investigated. Resolution of 2 μm was achieved with the SOG but there is evidence of curing by the laser pulse. Feature sizes of 3 μm were attained in PECA but this figure appears to be limited by the simple imaging system used.

Paper Details

Date Published: 10 April 1989
PDF: 6 pages
Proc. SPIE 1022, Laser Assisted Processing, (10 April 1989); doi: 10.1117/12.950112
Show Author Affiliations
J. D. Magan, Trinity College (Ireland)
M. Hogan, Trinity College (Ireland)
W. Blau, Trinity College (Ireland)
J. G. Lunney, Trinity College (Ireland)
J. G. Woods, Loctite (Ireland) Ltd. (Ireland)

Published in SPIE Proceedings Vol. 1022:
Laser Assisted Processing
Lucien Diego Laude; Gerhard K. Rauscher, Editor(s)

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