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Proceedings Paper

Experiences With The Reactive Low Voltage Ion Plating In Optical Thin Film Production
Author(s): K. Gurtler; U. Jeschkowski; E. Conrath
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Paper Abstract

The transmission of interference filters consisting of Ta205, Ti02, Zr02 and Si02 layers were measured at temperatures between 25°C and 185°C. Some characteristic differences between filters produced by reactive evaporation and reactive ion plating are demonstrated and discussed.

Paper Details

Date Published: 27 February 1989
PDF: 6 pages
Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989);
Show Author Affiliations
K. Gurtler, Schott Glaswerke (Germany)
U. Jeschkowski, Schott Glaswerke (Germany)
E. Conrath, Schott Glaswerke (Germany)

Published in SPIE Proceedings Vol. 1019:
Thin Film Technologies III
Karl H. Guenther; Hans K. Pulker, Editor(s)

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