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Proceedings Paper

Metrology Techniques for X-ray Lithography System Characterization
Author(s): B. Fay; V. Nagaswami; L. Tai
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Paper Abstract

Metrology techniques suitable for the characterization of X-ray lithography systems with submicron design rule capability are discussed in this paper. Registration and linewidth control are the main areas of investigation. Automated electrical measurements on special linewidth measuring test structures can be used for both registration and linewidth measurements. These techniques require some wafer processing steps. Other techniques that do not require special processing are the use of optical vernier structures for registration measurement and SEM analysis for linewidth measurement. Results obtained by these different techniques are presented and compared. Advantages, limitations and accuracy of each particular technique are discussed.

Paper Details

Date Published: 2 January 1986
PDF: 13 pages
Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); doi: 10.1117/12.949743
Show Author Affiliations
B. Fay, Micronix Corporation (United States)
V. Nagaswami, Micronix Corporation (United States)
L. Tai, Micronix Corporation (United States)

Published in SPIE Proceedings Vol. 0565:
Micron and Submicron Integrated Circuit Metrology
Kevin M. Monahan, Editor(s)

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