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Proceedings Paper

In-Situ Optical Monitoring Of Thin Film Deposition
Author(s): R. P. Netterfield; P. J. Martin; K. H. Muller
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Paper Abstract

Real time in-situ optical measurements play a vital role in the monitoring and control of thin film deposition and etching. Techniques include single and multiwavelength monitoring of the reflectance and/or transmittance of the coating substrate, in-situ ellipsometry, and spectroscopic diagnostics of the vapour species. This paper will review these techniques and examine recent trends.

Paper Details

Date Published: 10 March 1989
PDF: 6 pages
Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); doi: 10.1117/12.949322
Show Author Affiliations
R. P. Netterfield, CSIRO (Australia)
P. J. Martin, CSIRO (Australia)
K. H. Muller, CSIRO (Australia)

Published in SPIE Proceedings Vol. 1012:
In-Process Optical Measurements
Kenneth H. Spring, Editor(s)

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