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Proceedings Paper

Current Status Of Amorphous Silicon Device Technology
Author(s): Yoshihiro Hamakawa
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Paper Abstract

A review is given on recent progresses of amorphous silicon device technologies and its applications to solar cell. Firstly, some unique advantages of amorphous silicon as a new electronic material are pointed out with demonstrating some tangible examples in the live technology. Secondly, some topics in the R&D efforts on new film deposition trials related to high processing rate are introduced. Then, approaches to improve photovoltaic performances utilizing the optical and carrier confinement effects with new amorphous materials such as amorphous SiC, SiGe and micro-crystalline Si are demonstrated. In the final part, progress of the a-Si solar cell performances is also summarized and discussed.

Paper Details

Date Published: 9 May 1985
PDF: 9 pages
Proc. SPIE 0543, Photovoltaics, (9 May 1985); doi: 10.1117/12.948199
Show Author Affiliations
Yoshihiro Hamakawa, Osaka University (Japan)

Published in SPIE Proceedings Vol. 0543:
Satyen K. Deb, Editor(s)

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