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Proceedings Paper

EBR-9 Development In Heated Environment
Author(s): Samuel S.M. Fok; Patrick P. Tang; Keith Standiford
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Paper Abstract

EBR-9, a positive E-beam resist, was developed in Japan as a possible replacement for PBS with wider processing latitude. The MIBK/IPA develope5 systems took 8-15 minutes in immersion development to yield sensitivities below 1 uC/cm2 at 10 kV at temperatures of 25-30oC. The newer developer, Developer V, can be used either with immersion or heated nitrogen-assisted spray development to give similar sensitivity but with higher contrast, at shorter development time. Solubility rate data are also presented. Our results show this to be another milestone toward a resist system with more process latitude than the standard PBS process.

Paper Details

Date Published: 18 April 1985
PDF: 9 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947850
Show Author Affiliations
Samuel S.M. Fok, Perkin-Elmer (United States)
Patrick P. Tang, Perkin-Elmer (United States)
Keith Standiford, Perkin-Elmer (United States)

Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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