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Proceedings Paper

Optimization Of Resist Optical Density For High Resolution Lithography On Reflective Surfaces
Author(s): Andrew V. Brown; William H. Arnold
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Paper Abstract

The effect of positive photo resist's unbleachable absorbance on standing wave effects, reflective notching, scumming, exposure latitude and time, bleaching rates, and resist contrast has been evaluated using both theoretical simulation and experimental data. The addition of unbleachable dye to the resist film is shown to reduce reflective notching and the variation of dose with changing resist thickness. Adding dye also leads to a larger standing wave toe on the resist profiles and to increased exposure times. Bleaching rates are reduced and resist profiles are decreased from the vertical. Data is presented showing the improved CD control using dyed resist on interconnect layers.

Paper Details

Date Published: 18 April 1985
PDF: 8 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947841
Show Author Affiliations
Andrew V. Brown, Advanced Micro Devices (United States)
William H. Arnold, Advanced Micro Devices (United States)

Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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