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Proceedings Paper

Negative-Working E-Beam Copolymers
Author(s): Robert C. Daly; Michael J. Hanrahan; Richard W. Blevins
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Paper Abstract

Copolymers of allyl methacrylate and propargyl methacrylate have very high speed as electron-beam and x-ray resists. They produce polymers of a structural complexity not often encountered in addition polymerization. The structural variety available in allyl methacrylate polymers gives them unusual properties, which consequently enhance their microlithographic performance.

Paper Details

Date Published: 18 April 1985
PDF: 7 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947826
Show Author Affiliations
Robert C. Daly, Eastman Kodak Company (United States)
Michael J. Hanrahan, Eastman Kodak Company (United States)
Richard W. Blevins, Eastman Kodak Company (United States)

Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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