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Proceedings Paper

Optical Positive Resist Processing. II. Experimental And Analytical Model Evaluation Of Process Control.
Author(s): Michael P.C. Watts; M.Richard Hannifan
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Paper Abstract

A new analytical model of the exposure and development of optical positive resists is used to quantitatively evaluate process control. Using this model, a new method is described that allows for the rapid extraction of the characteristics parameters that describe the exposure and development of resists. Characteristic parameters were measured for AZ 1300SF in two concentrations of AZ 351 and AZ developers, respectively. Line width variations that would result from specific process variations were calculated for the different developers. It is clearly shown that dilute developers operating at optimal exposure doses give the best control.

Paper Details

Date Published: 18 April 1985
PDF: 8 pages
Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); doi: 10.1117/12.947810
Show Author Affiliations
Michael P.C. Watts, AZ Photoresist Products (United States)
M.Richard Hannifan, AZ Photoresist Products (United States)

Published in SPIE Proceedings Vol. 0539:
Advances in Resist Technology and Processing II
Larry F. Thompson, Editor(s)

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