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Proceedings Paper

Automatic Intensity Mapping Of Stepper Illumination At The Wafer Plane
Author(s): Randy Kodama
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Paper Abstract

A light intensity monitor has been developed for automated intensity mapping of the stepper exposure field at the wafer plane. The hardware consists of a microprocessor controlled light monitor which continuously collects and analyzes data obtained from multiple exposures in the illumination field.

Paper Details

Date Published: 23 July 1985
PDF: 4 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947772
Show Author Affiliations
Randy Kodama, UVP Inc. (United States)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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