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Proceedings Paper

Characterization Of Stepper - Lens Aberrations And Critical Dimension Control
Author(s): Paul Chien; Ling Liauw; Mung Chen
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Paper Abstract

Demands for higher resolution and larger field size are pushing the limits of optical design and manufacturing technology. A simple method of characterizing lens aberrations is proposed in this paper. The effects of astigmatism, field curvature and other aberrations are analyzed. A method of estimating the variation in focal depth for a given resist process and device technology is also proposed. The combined results can be used to determine the minimum feature size and maximum field size to be used with adequate linewidth control. In addition, the lens characterization method can be used for detecting problems with the lens quality and image orthogonality.

Paper Details

Date Published: 23 July 1985
PDF: 10 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947766
Show Author Affiliations
Paul Chien, Intel Corporation (United States)
Ling Liauw, Intel Corporation (United States)
Mung Chen, Intel Corporation (United States)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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