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Proceedings Paper

Reticle Sizing For Optimized CD Control
Author(s): Terry V. Nordstrom
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Paper Abstract

The effect of reticle sizing has been characterized for a single layer resist process employing a hotplate postexposure bake. Results are presented which show optimum CD control is obtained for feature sizing .25 to .3 microns less than the reticle size for clear field reticles. Process margins relative to exposure dose, topography and focus are presented.

Paper Details

Date Published: 23 July 1985
PDF: 6 pages
Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); doi: 10.1117/12.947747
Show Author Affiliations
Terry V. Nordstrom, Hewlett-Packard Corporation (United States)

Published in SPIE Proceedings Vol. 0538:
Optical Microlithography IV
Harry L. Stover, Editor(s)

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