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Proceedings Paper

A Sub-Micron Electron Beam Lithography System For Laboratory Use
Author(s): Shizuo Kimoto; Hajime Kohinata
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Paper Abstract

A simple, low cost, multipurpose electron beam lithography system for sub-micron pattern was developed for personal use in laboratory. It has a capability of circle pattern generation and saves a time of pattern drawing for development of new device. There are several examples of fine pattern with few-tenth μm line and space which are drawn by the system.

Paper Details

Date Published: 20 June 1985
PDF: 4 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947499
Show Author Affiliations
Shizuo Kimoto, ELIONIX Inc. (Japan)
Hajime Kohinata, ELIONIX Inc. (Japan)


Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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