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Proceedings Paper

A High Performance Negative X-Ray Resist : CPMS-X(Pd)
Author(s): Nobuyuki Yoshioka; Yoshiki Suzuki; Teruhiko Yamazaki
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Paper Abstract

The characteristics of CPMS (chlorinated polymethylstyrene) to Pd Loc were investigated to obtain the high performance negative x-ray resist. From the results, the high sensitive x-ray negative resist (Dg0.5=17mJ/cm2), CPMS-X(Pd), were obtained by determining both the optimum molecular weight and the optimum chlorine content to Pd Loc. It was found that this resist also has both high contrast and high dry etching resistivity. This resist can be believed to be a milestone for practical use of x-ray lithography for future VLSI devices.

Paper Details

Date Published: 20 June 1985
PDF: 6 pages
Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); doi: 10.1117/12.947485
Show Author Affiliations
Nobuyuki Yoshioka, Mitsubishi Electric Corporation (Japan)
Yoshiki Suzuki, Mitsubishi Electric Corporation (Japan)
Teruhiko Yamazaki, Mitsubishi Electric Corporation (Japan)

Published in SPIE Proceedings Vol. 0537:
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
Phillip D. Blais, Editor(s)

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