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Proceedings Paper

Magnetron Sputtering High Tc Films From Metal Alloy Targets
Author(s): Michael Scheuermann; Cheng-Chung Chi; Chang C. Tsuei; Jochen D. Mannhart
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Paper Abstract

High Tc YBaCuO thin films have been deposited by dc magnetron sputtering from two metal alloy targets. Oxygen was sprayed directly onto the film to be chemically incorporated into the film. Since most of the oxygen was absorbed by the film directly, low oxygen partial pressure was achieved to avoid target oxidation. Epitaxial and polycrystalline films with onsets at 92 K having 1 K transition widths have been produced. Films have been deposited on a variety of substrates including LiNbO3 and LiTa03. For potential application in electronic devices and for many electrical measurements, it is important to pattern the films. Laser patterning has been demonstrated successfully with no degradation of the film properties. The advantages of laser processing are short turn around time and no wet processing associated with conventional lithography. Using this technique, lines as narrow as 1 micron have been fabricated.

Paper Details

Date Published: 23 August 1988
PDF: 6 pages
Proc. SPIE 0948, High-Tc Superconductivity: Thin Films and Devices, (23 August 1988); doi: 10.1117/12.947475
Show Author Affiliations
Michael Scheuermann, IBM Research Division (United States)
Cheng-Chung Chi, IBM Research Division (United States)
Chang C. Tsuei, IBM Research Division (United States)
Jochen D. Mannhart, IBM Research Division (United States)

Published in SPIE Proceedings Vol. 0948:
High-Tc Superconductivity: Thin Films and Devices
Cheng-Chung John Chi; R. Bruce van Dover, Editor(s)

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