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Proceedings Paper

Rapid Isothermal Processing (RIP) Of Dielectrics
Author(s): R. Singh; F. Radpour
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Paper Abstract

Rapid isothermal processing (RIP) based on incoherent sources of light has emerged as a major semiconductor processing technique. In this paper, a review of our own and other works on the RIP of dielectrics is presented.

Paper Details

Date Published: 16 August 1988
PDF: 12 pages
Proc. SPIE 0945, Advanced Processing of Semiconductor Devices II, (16 August 1988); doi: 10.1117/12.947394
Show Author Affiliations
R. Singh, University of Oklahoma (United States)
F. Radpour, University of Oklahoma (United States)

Published in SPIE Proceedings Vol. 0945:
Advanced Processing of Semiconductor Devices II
Harold G. Craighead; Jagdish Narayan, Editor(s)

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