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Proceedings Paper

EELS And XPS Investigation On Amorphous Silicon Carbide Alloy Film
Author(s): Zhang Fang-qing; Chen Guang-hua; Xu Xi-xiang
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Paper Abstract

The EELS and XPS measurements are used to analyze the amorphous silicon-carbon-hydrogen alloy films deposited by r.f. reactive sputtering method (RS a-SixCl_x:H). Based on the results of EELS and XPS, considering other optical and electrical measurements, that the structural change occured at 1-x (carbon content)=0.4 in the alloy film was further verified.

Paper Details

Date Published: 28 June 1985
PDF: 6 pages
Proc. SPIE 0524, Spectroscopic Characterization Techniques for Semiconductor Technology II, (28 June 1985); doi: 10.1117/12.946327
Show Author Affiliations
Zhang Fang-qing, Lanzhou University (China)
Chen Guang-hua, Lanzhou University (China)
Xu Xi-xiang, Lanzhou University (China)


Published in SPIE Proceedings Vol. 0524:
Spectroscopic Characterization Techniques for Semiconductor Technology II
Fred H. Pollak; Raphael Tsu, Editor(s)

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