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Proceedings Paper

Application And Analysis Of Production Suitability Of A Laser-Based Plasma X-Ray Stepper
Author(s): Darryl W Peters; Jerry P Drumheller; Robert D Frankel; Anne S. Kaplan; Stephen M. Preston; David N Tomes
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Paper Abstract

A broadly applicable lithography tool figure of merit will be presented and evaluated for present technologies. A comparison of the cost effectiveness of current lithographic technologies shows that a laser generated, soft x-ray plasma proximity stepper is superior to competing technologies for production applications at one micrometer and below. The technology developments that make a soft x-ray proximity stepper more cost effective than other high resolution lithographic technologies will be discussed. Soft x-ray exposure sensitivity data will be presented for conventional novolak resists and acid catalyzed high sensitivity novolak-based materials. Resist profiles from soft x-ray exposures of standard, novolak-based resists will be compared to simulations obtained from a modified version of SAMPLE. In addition, x-ray and optical aerial image contrast calculations from SAMPLE will be compared. Novel aspects of the patented, high brightness Hampshire x-ray source will be presented and a comparison to other x-ray sources will be made. Lastly, the preliminary performance of a stepper employing Hampshire's laser-based x-ray plasma source will be presented indicating the performance achieved to date.

Paper Details

Date Published: 14 June 1988
PDF: 19 pages
Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945630
Show Author Affiliations
Darryl W Peters, Hampshire Instruments, Inc (United States)
Jerry P Drumheller, Hampshire Instruments, Inc (United States)
Robert D Frankel, Hampshire Instruments, Inc (United States)
Anne S. Kaplan, Hampshire Instruments, Inc. (United States)
Stephen M. Preston, Hampshire Instruments. Inc (United States)
David N Tomes, Hampshire Instruments, Inc (United States)

Published in SPIE Proceedings Vol. 0923:
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
Arnold W. Yanof, Editor(s)

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