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Proceedings Paper

Ellipsometric Measurement Methods For Thin Film Technology
Author(s): H. Schwiecker; K-H. Hammann; U. Schneider
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Paper Abstract

Ellipsometric measurement methods allow the characterization of interfaces or thin films between two media. The non-pertubing character combined with a remarkable sensitivity makes these optical techniques suitable for in-situ measurements. Therefore the study to thicknesses and refractive indices of thin films during a vacuum coating process is one of many applications. The present paper will introduce an automatic photometric ellipsometer, which can operate together with high vacuum and ultra high vacuum plants. This rotating-analyzer ellipsometer (RAE) is one that uses a motor driven rotating analyzer to detect the state of polarization of light after its reflection from a surface under measurement. The use of a 32-bit-microcomputer together with a floating point processor makes it possible to compute one thickness and one refractive index value every 1.8 second also for multi-layer systems consisting of dielectrics and metals. After a detailed discussion of the hardware components and of the software tools, the precision of the instrument will be demonstrated by means of different applications.

Paper Details

Date Published: 29 June 1988
PDF: 12 pages
Proc. SPIE 0891, Polarization Considerations for Optical Systems, (29 June 1988);
Show Author Affiliations
H. Schwiecker, Technische Fachhochschule Berlin (Germany)
K-H. Hammann, Technische Fachhochschule Berlin (Germany)
U. Schneider, Technische Fachhochschule Berlin (Germany)

Published in SPIE Proceedings Vol. 0891:
Polarization Considerations for Optical Systems
Russell A. Chipman, Editor(s)

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