Proceedings Paper
Photothermal Deflection Analysis Of Uv Optical Thin Films| Format | Member Price | Non-Member Price |
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Paper Abstract
This paper offers a status report of photothermal-deflection microscopy applied to defect analysis in UV dielectric thin films. Absorption maps obtained by this technique from such films are presented and detection limits are discussed. A comparison with other relevant observations such as laser damage is being undertaken.
Paper Details
Date Published: 15 August 1984
PDF: 7 pages
Proc. SPIE 0476, Excimer Lasers: Their Applications & New Frontiers in Lasers, (15 August 1984); doi: 10.1117/12.942583
Published in SPIE Proceedings Vol. 0476:
Excimer Lasers: Their Applications & New Frontiers in Lasers
Ronald W. Waynant, Editor(s)
PDF: 7 pages
Proc. SPIE 0476, Excimer Lasers: Their Applications & New Frontiers in Lasers, (15 August 1984); doi: 10.1117/12.942583
Show Author Affiliations
A. Schmid, University of Rochester (United States)
D. Smith, University of Rochester (United States)
D. Smith, University of Rochester (United States)
M. Guardalben, University of Rochester (United States)
J. Abate, Eastman Kodak Company (United States)
J. Abate, Eastman Kodak Company (United States)
Published in SPIE Proceedings Vol. 0476:
Excimer Lasers: Their Applications & New Frontiers in Lasers
Ronald W. Waynant, Editor(s)
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