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Proceedings Paper

Reticle Contamination Monitor For A Wafer Stepper
Author(s): Akikazu Tanimoto; Kazunori Imamura
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Paper Abstract

A reticle contamination monitor having enough sensitivity for a 5:1 stepper has been developed. By scanning a laser spot in a raster mode and monitoring the light scattered by particles, this apparatus can detect spherical beads of 2 μm or larger diameter and various kinds of particles of 5pm or larger size. In order to detect small particles without the disturbance due to the light intensely scattered by reticle patterns, and to distinguish particle light signals from pattern light signals, the monitor has plural detectors arranged to receive scattered light rays that proceed in different directions. It takes two minutes to inspect both surfaces of a reticle of which inspection area is 100mm X 100mm. An automatic reticle transfer mechanism with this monitor is built into a stepper, so that a reticle is moved from a reticle case to both the inspection box and the exposure station without being contaminated. Periodic inspection with this apparatus prevents the deterioration in yield caused by reticle contamination. And a new type of reticle cleaner equipped with this contamination monitor has been developed to make it easy to clean a reticle.

Paper Details

Date Published: 29 June 1984
PDF: 8 pages
Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941923
Show Author Affiliations
Akikazu Tanimoto, Nippon Kogaku K.K. (Japan)
Kazunori Imamura, Nippon Kogaku K.K. (Japan)

Published in SPIE Proceedings Vol. 0470:
Optical Microlithography III: Technology for the Next Decade
Harry L. Stover, Editor(s)

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