Share Email Print

Proceedings Paper

Overview Of Current Scatterometer Measurements And The Impact On Optical Systems
Author(s): John C. Stover
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Scatter in optical systems reduces signal, creates optical noise, limits resolution and has proved to be an unexpected problem in more than one optical design. On the other hand, measurement and analysis of scatter from optical components and systems is a sensitive non-contact source of information that can be used for component acceptance and control of production processes to improve surface finish. The optics required for many of the systems on the drawing board today will need to meet scatter specifications in order to function as intended. Choosing the correct scatter specification for a particular component is not always a trivial task and often when an appropriate specification is chosen there is a problem in getting the measurements taken. The temptation to rely on Total Integrated Scatter (TIS) measurements or on surface profiling via interferometry or stylus systems) is great. Unfortunately predicting scatter from profile measurements is not easy [1] and TIS is often inappropriate.

Paper Details

Date Published: 6 November 1987
PDF: 9 pages
Proc. SPIE 0776, Metrology of Optoelectronic Systems, (6 November 1987);
Show Author Affiliations
John C. Stover, Mathis & Associates, Inc. (United States)

Published in SPIE Proceedings Vol. 0776:
Metrology of Optoelectronic Systems
Edward M. Granger, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?