Proceedings Paper
Applications Of A High-Speed, High-Resolution Metrology System| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
It has been well established by previous work that high resolution electron-beam imaging is required to accurately measure dimensions near a micron and below. A brief overview of the applications for micrometrology system indicates that speed of operation or thruput is very important. A recently developed system is described which has been specifically designed for low voltage, high-speed micrometrology.
Paper Details
Date Published: 17 April 1987
PDF: 14 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940426
Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)
PDF: 14 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940426
Show Author Affiliations
KarI L. Harris, KLA Instruments (United States)
Sakae Miyauchi, Holon Inc. (Japan)
Sakae Miyauchi, Holon Inc. (Japan)
Takao Namae, Holon Inc. (Japan)
Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)
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