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Proceedings Paper

Analysis Of Linewidth Measurement Techniques Using The Low Voltage SEM
Author(s): M. G. Rosenfield
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Paper Abstract

Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary and backscattered electron signal generated by that structure1-6. Thus, an accurate measurement requires an understanding of how the profile and critical dimension of the line being measured relate to the electron signal. The complicating factor is that different features generate different signals and that surroundings often influence the detected signal from a given feature.

Paper Details

Date Published: 17 April 1987
PDF: 10 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940413
Show Author Affiliations
M. G. Rosenfield, IBM T.J. Watson Research Center (United States)

Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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