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Proceedings Paper

Automatic Linewidth Control System
Author(s): Laura J. Uhler
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Paper Abstract

A system used to provide linewidth control in a IC manufacturing facility is described. It combines the use of interferometry, real time endpoint detection, and automation to tighten linewidth distributions by adjusting development times. The use of Fourier Transforms provide consistent endpoint detection for a variety of part, process, and substrate types. The system increases throughput and reduces rework by eliminating the need for trial wafers. It also provides a means for process monitoring as well as a tool for troubleshooting, and process development. The paper describes the Automatic Linewidth Control System: its operation, algorithms for endpoint detection and its performance.

Paper Details

Date Published: 17 April 1987
PDF: 6 pages
Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940405
Show Author Affiliations
Laura J. Uhler, Hewlett-Packard Company (United States)

Published in SPIE Proceedings Vol. 0775:
Integrated Circuit Metrology, Inspection, & Process Control
Kevin M. Monahan, Editor(s)

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