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Proceedings Paper

A Direct Write Laser Pattern Generator For Rapid Semiconductor Device Customization
Author(s): E. T. Fitzgibbons; M. Kempter; R. Walther
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Paper Abstract

A turn-key system for rapidly producing application specific integrated circuit devices (ASICs) has been developed. A design program is translated from the compiler work station directly to the interconnection metallization of a pre-processed but unpersonalized wafer by a direct write laser pattern generator (DWLPG). This instrument efficiently and precisely exposes photoresist and allows interconnection metal not pertinent to the circuit operation to be removed by etching.

Paper Details

Date Published: 1 September 1987
PDF: 6 pages
Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940391
Show Author Affiliations
E. T. Fitzgibbons, Lasarray S.A. (Switzerland)
M. Kempter, Lasarray S.A. (Switzerland)
R. Walther, Lasarray S.A. (Switzerland)

Published in SPIE Proceedings Vol. 0774:
Lasers in Microlithography
John Samuel Batchelder; Daniel J. Ehrlich; Jeff Y. Tsao, Editor(s)

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