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Proceedings Paper

Achievements Of Recent Research In Focused-Ion-Beam Technology
Author(s): R. Aihara; H. Sawaragi
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Paper Abstract

The focused ion beam (FIB) technology has various applications such as microfabrication and micromachining. Two FIB systems, JIBL-106S and JIBL-150, which can perform pattern writing using pattern data from a CAD system have been developed. Both systems have the ability to produce actual devices. Using the FIB systems, various experiments have been performed, and some of the resutls have offered new fabrication processes of semiconductor devices.

Paper Details

Date Published: 30 June 1987
PDF: 6 pages
Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); doi: 10.1117/12.940377
Show Author Affiliations
R. Aihara, Jeol Ltd. (Japan)
H. Sawaragi, Jeol Ltd. (Japan)

Published in SPIE Proceedings Vol. 0773:
Electron-Beam, X-Ray, and Ion-Beam Lithographies VI
Phillip D. Blais, Editor(s)

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