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Proceedings Paper

Advances In Focused-Ion-Beam Repair Techniques
Author(s): Nicholas P. Economou; David C. Shaver; Bill Ward
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Paper Abstract

The use of focused-ion-beam (FIB) technology for the repair of masks and for the modification of integrated circuits is discussed. The processes required for these two applications are similar and can thus be implemented by similar systems. Focused-ion-beam sputtering and focused-ion-beam induced deposition results are presented which show the usefulness of FIB techniques for repair applications.

Paper Details

Date Published: 30 June 1987
PDF: 5 pages
Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); doi: 10.1117/12.940372
Show Author Affiliations
Nicholas P. Economou, Micrion Corporation (United States)
David C. Shaver, Micrion Corporation (United States)
Bill Ward, Micrion Corporation (United States)

Published in SPIE Proceedings Vol. 0773:
Electron-Beam, X-Ray, and Ion-Beam Lithographies VI
Phillip D. Blais, Editor(s)

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