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Proceedings Paper

An X-Ray Stepper For Production Lithography
Author(s): E. Cullmann; K . A . Cooper; W. Vach
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Paper Abstract

With design rules for integrated circuits attaining the_submicron range and current lithography techniques being pushed to their limits, the need for new lithography tools has become acute. A candidate for this is an X-ray stepper wilich provides high resolution with process latitude as well as high throughput. This paper will describe such a stepper.

Paper Details

Date Published: 30 June 1987
PDF: 5 pages
Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); doi: 10.1117/12.940346
Show Author Affiliations
E. Cullmann, Karl Suss (West Germany)
K . A . Cooper, Karl Suss (West Germany)
W. Vach, Karl Suss (West Germany)


Published in SPIE Proceedings Vol. 0773:
Electron-Beam, X-Ray, and Ion-Beam Lithographies VI
Phillip D. Blais, Editor(s)

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