Share Email Print

Proceedings Paper

An X-Ray Stepper For Production Lithography
Author(s): E. Cullmann; K . A . Cooper; W. Vach
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

With design rules for integrated circuits attaining the_submicron range and current lithography techniques being pushed to their limits, the need for new lithography tools has become acute. A candidate for this is an X-ray stepper wilich provides high resolution with process latitude as well as high throughput. This paper will describe such a stepper.

Paper Details

Date Published: 30 June 1987
PDF: 5 pages
Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); doi: 10.1117/12.940346
Show Author Affiliations
E. Cullmann, Karl Suss (West Germany)
K . A . Cooper, Karl Suss (West Germany)
W. Vach, Karl Suss (West Germany)

Published in SPIE Proceedings Vol. 0773:
Electron-Beam, X-Ray, and Ion-Beam Lithographies VI
Phillip D. Blais, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?