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Proceedings Paper

Ultrasound-Assisted Deposition Of Dielectric Films
Author(s): C K Hwangbo; M R Jacobson; H A Macleod; R H Potoff
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Paper Abstract

The effects of ultrasound-assisted deposition (UAD) of ZrOx , Ta0x , and MgFx films on their optical properties have been investigated. The direction of vibration is transverse to the direction of growing films on substrates that are glued to tubular piezoelectric transducers driven by a power amplifier. Results indicate that ultrasonic powers above 20 W/cm2 are required to induce detectable changes in UV absorption and vacuum-to-air shifts of spectral profiles. UAD is likely to induce oxygen and fluoride deficiencies in oxide and fluoride films and increase the packing density of films. No significant changes between UAD and conventional films were observed in x-ray diffraction analysis, humidity testing, and Nomarski microscopy.

Paper Details

Date Published: 23 December 1986
PDF: 10 pages
Proc. SPIE 0678, Optical Thin Films II: New Developments, (23 December 1986); doi: 10.1117/12.939549
Show Author Affiliations
C K Hwangbo, University of Arizona (United States)
M R Jacobson, University of Arizona (United States)
H A Macleod, University of Arizona (United States)
R H Potoff, University of Arizona (United States)

Published in SPIE Proceedings Vol. 0678:
Optical Thin Films II: New Developments
Richard Ian Seddon, Editor(s)

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