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Proceedings Paper

Ion-Assisted Deposition Of Fluorides
Author(s): J D Targove; M J Messerly; J P Lehan; C C Weng; R H Potoff; H A Macleod; L C McIntyre Jr.; J A Leavitt
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Paper Abstract

Ion-assisted deposition (IAD) has been used to deposit magnesium fluoride, cryolite (Na3A1F6), and lanthanum fluoride films on ambient temperature substrates. IAD magnesium fluoride coatings show increased density and moisture resistance, while IAD lanthanum fluoride coatings exhibit increased refractive indices. Cryolite films, however, do not significantly benefit from IAD. Oxygen, rather than argon, as the bombarding species reduces bombardment-induced absorption in the visible, but may produce an additional oxide absorption edge in the ultraviolet.

Paper Details

Date Published: 23 December 1986
PDF: 8 pages
Proc. SPIE 0678, Optical Thin Films II: New Developments, (23 December 1986); doi: 10.1117/12.939545
Show Author Affiliations
J D Targove, University of Arizona (United States)
M J Messerly, University of Arizona. (United States)
J P Lehan, University of Arizona (United States)
C C Weng, University of Arizona (United States)
R H Potoff, University of Arizona (United States)
H A Macleod, University of Arizona (United States)
L C McIntyre Jr., University of Arizona (United States)
J A Leavitt, University of Arizona (United States)

Published in SPIE Proceedings Vol. 0678:
Optical Thin Films II: New Developments
Richard Ian Seddon, Editor(s)

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