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Proceedings Paper

Planar And Channel Waveguides Fabricated By Nitrogen Ion Implantation In Fused Silica
Author(s): I K. Naik
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Paper Abstract

Single-mode, planar and channel waveguides were fabricated in fused silica substrates by sequential, high-energy (100 keV and 300 keV) nitrogen ion implantations. The planar waveguides were characterized by measurements of waveguide loss and guided-mode effective refractive indices. It was found that a post-implantation annealing treatment reduced the waveguide loss to a value as low as (0.1±0.1)dB/cm. Chemical characterization of the implanted and annealed surfaces, carried out by means of Auger electron spectroscopy, showed that nitrogen was incorporated into the silica glass as a result of the N+ implantations. Channel waveguides were also fabricated (using photolithographically-generated implantation masks in thin gold films) and evaluated in terms of their mode refractive indices.

Paper Details

Date Published: 26 September 1984
PDF: 4 pages
Proc. SPIE 0460, Processing of Guided Wave Optoelectronic Materials I, (26 September 1984); doi: 10.1117/12.939457
Show Author Affiliations
I K. Naik, Northrop Research and Technology Center (United States)

Published in SPIE Proceedings Vol. 0460:
Processing of Guided Wave Optoelectronic Materials I
Robert L. Holman; Donald Morgan Smyth, Editor(s)

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