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Proceedings Paper

Optimization Of The Optics Matching A Storage Ring To An X-Ray Lithography Camera
Author(s): Rolf P. Haelbich
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Paper Abstract

An oscillating grazing incidence mirror can be used to achieve vertically uniform illumination with a synchrotron radiation source. To increase the intensity it has been suggested previously to use a figured mirror rather than a plane mirror so that light from a larger horizontal angle can be directed into the exposure area. This paper presents results of ray-tracing calculations that show how much the intensity can actually be increased while maintaining good horizontal uniformity. Cylindrical, parabolic and elliptical mirrors are investigated and geometrical parameters are optimized. It is shown further that with an ellipsoid the throughput of a step-and-repeat camera is almost independent of the exposure field size. The parameters of the IBM X-ray lithography beamline are discussed.

Paper Details

Date Published: 19 March 1984
PDF: 11 pages
Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); doi: 10.1117/12.939211
Show Author Affiliations
Rolf P. Haelbich, IBM Thomas J. Watson Research Center (United States)

Published in SPIE Proceedings Vol. 0448:
X-Ray Lithography and Applications of Soft X-Rays to Technology
Alan D. Wilson, Editor(s)

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