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Proceedings Paper

Soft X-Ray Photoemission Techniques For Characterizing Metal-Semiconductor Interfaces
Author(s): L J Brillson
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Paper Abstract

The wide energy range and tunability of synchrotron radiation provide soft x-ray photoemission spectroscopy (SXPS) with several effective methods for characterizing metal-semiconductor interfaces on an atomic scale. These SXPS techniques reveal that metal-semiconductor interfaces are in general not abrupt and that the detailed atomic structure is a controlling factor in determining interface electronic structure.

Paper Details

Date Published: 27 March 1984
PDF: 13 pages
Proc. SPIE 0447, Science with Soft X-Rays, (27 March 1984); doi: 10.1117/12.939185
Show Author Affiliations
L J Brillson, Xerox Webster Research Center (United States)

Published in SPIE Proceedings Vol. 0447:
Science with Soft X-Rays
Roger W. Klaffky; F. J. Himpsel, Editor(s)

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