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Proceedings Paper

An Evaporation Monitoring System featuring "Software" Trigger Points and On line Evaluation of Refractive Indices
Author(s): Christian Schroedter
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Paper Abstract

A microcomputer based evaporation monitoring system is presented which operates on a standard production plant equipped with standard thin film measuring devices: photometer and quartz crystal monitor. The computer acts as an evaporation data acquisition and storage system. The transmission T of a sample substrate as well as the film thickness d taken from the quartz monitor are recorded digitally vs. time. The T-d relation is on line least-squares fitted to the theoretical T-d function of an arbitrary nonabsorbing homogeneous layer deposited on an arbitrary stack. Using the fit function an optical thickness can be expressed in terms of the linear parameter d for instance as trigger point for termination of the deposition process. The procedure is especially suitable in turning points. In non-absorbing systems the fit function directly yields the refractive index of the layer.

Paper Details

Date Published: 13 October 1986
PDF: 6 pages
Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); doi: 10.1117/12.938352
Show Author Affiliations
Christian Schroedter, Max:Planck-Institut fuer Quantenoptik (Germany)

Published in SPIE Proceedings Vol. 0652:
Thin Film Technologies II
J. Roland Jacobsson, Editor(s)

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