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Proceedings Paper

Laser Photochemical Vapor Deposition
Author(s): J. G. Eden; K. K. King; E.A. P. Cheng; S. A. Piette; D. B. Geohegan
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Paper Abstract

A brief overview of the status of laser photochemical vapor deposition (LPVD) will be given, with emphasis on large area processing. Recent experiments, in which chemical vapor deposition of Ge (or Si) has been "triggered" by ultraviolet (UV) laser photodissociation of GeH4 (or Si2H6), are described.

Paper Details

Date Published: 11 March 1987
PDF: 3 pages
Proc. SPIE 0710, Excimer Lasers and Optics, (11 March 1987); doi: 10.1117/12.937295
Show Author Affiliations
J. G. Eden, University of Illinois (United States)
K. K. King, University of Illinois (United States)
E.A. P. Cheng, University of Illinois (United States)
S. A. Piette, University of Illinois (United States)
D. B. Geohegan, University of Illinois (United States)


Published in SPIE Proceedings Vol. 0710:
Excimer Lasers and Optics
Ting-Shan Luk, Editor(s)

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