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Proceedings Paper

Thin Film Oxides Of Vanadium, Niobium, And Tantalum For Integrated Optics
Author(s): Richard L. Davis; Fred S. Hickernell
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Paper Abstract

Thin films of V2O5, Nb2O5, and Ta2O5 have been grown under a variety of conditions including reactive rf sputtering, reactive bias sputtering, and post deposition oxidation. The refractive index and guided-wave attenuation have been measured for both as-grown and annealed films. Except for V205, where low losses were not achieved, general guidelines were established for optimal growth conditions resulting in high refractive index low loss films. Films of Nb2O5 and Ta2O5 have been used in the fabrication of guided wave Bragg cells and waveauidp Lunphura lenses.

Paper Details

Date Published: 30 November 1983
PDF: 7 pages
Proc. SPIE 0408, Integrated Optics III, (30 November 1983); doi: 10.1117/12.935702
Show Author Affiliations
Richard L. Davis, Motorola Inc. (United States)
Northrop Research and Technology Center (United States)
Fred S. Hickernell, Motorola Inc. (United States)

Published in SPIE Proceedings Vol. 0408:
Integrated Optics III
Dennis G. Hall; Lynn D. Hutcheson, Editor(s)

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